Magnetron-sputter PVD-seadeCemeCon
CC 800/9 HIPIMS
Magnetron-sputter PVD-seade
CemeCon
CC 800/9 HIPIMS
Tootmisaasta
2006
Seisund
Kasutatud
Asukoht
Bremen 

Pildid näitavad
Kuva kaart
Andmed masina kohta
- Masina nimetus:
- Magnetron-sputter PVD-seade
- Tootja:
- CemeCon
- Mudel:
- CC 800/9 HIPIMS
- Masina number:
- 11176
- Tootmisaasta:
- 2006
- Seisund:
- kasutatud
- Töövõimekus:
- täielikult töökorras
Hind ja asukoht
- Asukoht:
- Bremen, Saksamaa

Helistada
Pakkumise üksikasjad
- kuulutuse ID:
- A20922332
- Viitenumber:
- HIPIMS
- Värskendus:
- viimati kuupäeval 13.01.2026
Kirjeldus
We are offering this used CemeCon CC 800/9 HIPIMS Magnetron Sputtering PVD System, year of manufacture 2006.
Manufacturer: CemeCon
Model: CC 800/9
Serial number: 11176
Year of manufacture: 2006, upgraded in 2013 and 2025
Weight: 3,000 kg
Protection rating: IP 20
Power rating: 166 kVA
Evaporators: 6
Voltage: 3x400/N/PE V
Frequency: 50/60 Hz
Iodpfxex Tt T Ro Abfjht
Cemecon CC800/9 HIPIMS
- 6 cathodes
- All cathodes DC, 2 also HIPIMS capable
- Booster anodes
- 4 gases, 1 of which is flammable
- BIAS: DC, MF-pulsed, or HIPIMS
- 3x heating
- 2 turbo pumps
- 6-position substrate holder
- Multiple targets
- Includes option for BNC terminal for Peak I, U, and P at HIPIMS cathodes + BIAS
- Extensive accessories such as loading material, spare parts, consumables
- In 07/2023, the system control was upgraded to the latest standards and a manufacturer service was performed.
A bundle option is also available including a chiller, a precision substrate cleaning system, and a lapping/polishing machine.
If you have any questions or require further information, please feel free to send us a message or call us.
Kuulutus tõlgiti automaatselt. Tõlkevigu võib esineda.
Manufacturer: CemeCon
Model: CC 800/9
Serial number: 11176
Year of manufacture: 2006, upgraded in 2013 and 2025
Weight: 3,000 kg
Protection rating: IP 20
Power rating: 166 kVA
Evaporators: 6
Voltage: 3x400/N/PE V
Frequency: 50/60 Hz
Iodpfxex Tt T Ro Abfjht
Cemecon CC800/9 HIPIMS
- 6 cathodes
- All cathodes DC, 2 also HIPIMS capable
- Booster anodes
- 4 gases, 1 of which is flammable
- BIAS: DC, MF-pulsed, or HIPIMS
- 3x heating
- 2 turbo pumps
- 6-position substrate holder
- Multiple targets
- Includes option for BNC terminal for Peak I, U, and P at HIPIMS cathodes + BIAS
- Extensive accessories such as loading material, spare parts, consumables
- In 07/2023, the system control was upgraded to the latest standards and a manufacturer service was performed.
A bundle option is also available including a chiller, a precision substrate cleaning system, and a lapping/polishing machine.
If you have any questions or require further information, please feel free to send us a message or call us.
Kuulutus tõlgiti automaatselt. Tõlkevigu võib esineda.
Pakkuja
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